BITLER CVD Furnace provides a controlled environment for advanced Chemical Vapor Deposition (CVD) processes, supporting silicon carbide coating, ZnO nanostructure growth, and other specialized material applications.
Designed for laboratory research and advanced material development, it is ideal for ceramic substrate conductivity testing and multilayer ceramic capacitor (MLCC) atmosphere sintering experiments, delivering reliable performance and precise process control.
| Model | Single & Double Temperature | |
| Heating Zone Length | 420 mm | |
| Temp. Resolution | 1oC | |
| Heating Rate | 0-20oC/min |
| Model | Single Temperature | |
| Heating Zone Length | 200 mm | |
| Temp. Resolution | 1oC | |
| Heating Rate | 0-20oC/min |
| Model | Single & Double Temperature | |
| Heating Zone Length | 200mm - 600 mm | |
| Temp. Resolution | 1oC | |
| Heating Rate | 0-20oC/min |
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